Greg Parsons
Greg received a Bachelor’s degree in Physics from the State University of New York and a PhD in Physics in at NC State University studying Plasma CVD of Hydrogenated Amorphous Silicon. In 1990 he began a postdoc at IBM TJ Watson Research Center working on thin film transistor materials for flat panel displays, and joined NC State Chemical Engineering in 1992 as an Assistant Professor to explore surface reactions in thin film materials, including Atomic Layer Deposition.
Parsons’ research group studies chemical reactions on surfaces, with focus on thin film formation by Atomic Layer Deposition (ALD). We work to discover and explain new fundamental understanding of chemical reactions on surfaces, and develop innovative atomic-scale chemical processes to create new functional materials, structures and devices.
